China’s EUV light source prototype hits 90% domestic content, 3-5 years from mass production

The headline number is localization, but the more telling detail is the technical route matching leading international vendors — that suggests the effort is aimed at replicating an established lithography path rather than inventing around it. Because EUV light sources sit at the very front of advanced chipmaking, any credible domestic alternative touches the whole semiconductor supply chain, not just one vendor. The stated 3-5 year horizon to mass production is the open question: prototype exposure testing and volume manufacturing are very different problems, and whether the localization rate holds as the system scales is what to watch.