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Chinese Scientists Achieve Atomic Slip That Switches Resistance Ten-Million-Fold

A research team at the Institute of Semiconductors, Chinese Academy of Sciences, used two-dimensional van der Waals heterojunction interface engineering to achieve atomic-layer slip of just 0.1 nanometres, producing a ten-million-fold change in resistance. The breakthrough addresses the trade-off between high on/off ratio and durability in sliding ferroelectric tunnel junctions. The findings were published on September 11 in the journal Science.

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AI take

This matters less as a device milestone than as a materials-engineering one: the team appears to have decoupled the on/off ratio from the wear problem that has dogged sliding ferroelectric tunnel junctions, by controlling slip at the van der Waals interface rather than in the bulk. The immediate audience is the neuromorphic and low-power memory research community, where resistance-switching ratios of this magnitude are the long-sought ingredient. Whether the effect survives repeated cycling and can be reproduced outside a laboratory interface is the open question.

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